Nanofabrication: Principles, Capabilities and Limits presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. The nanofabrication techmologies covered in the book include photon-based lithography, charged particle beams lithography, nanofabrication using scanning probes, nanoreplications, nanoscale pattern transfer, nanofabrication by molecular assembly and various indirect nanofabrication techniques. Principles of each technology are introduced and illustrated with minimum mathematics involved. The capabilitiesof each technology in making sub-100nm structures are described. The limits of preventing a technology from further going down the dimensional scale are analyzed. Provides the reader with the most up to date information and development in the Nanofabrication area. Readers will learn the advantages and disadvantages of specific nanofabrication techniques depending on the application theyare working on. Focuses on the practical aspects of nanofabrication with examples drawn from both primary research and industrial applications INDICE: Introduction. Nanofabrication by photons. Nanofabrication by charged particle beams. Nanofabrication by scanning probes. Nanofabrication by replication. Nanoscale pattern transfer. Indirect nanofabrication. Nanofabricationby molecular self-organization.
- ISBN: 978-0-387-75576-2
- Editorial: Springer
- Encuadernacion: Cartoné
- Páginas: 350
- Fecha Publicación: 01/05/2008
- Nº Volúmenes: 1
- Idioma: Inglés