Developments in Surface Contamination and Cleaning: Wet and Dry Cleaning Methods

Volume 7 & 8The device sizes in the semiconductor industries are shrinking, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. New cleaning techniques will have to be considered and employed for contaminant removal. Similarly, new cleaning techniques for molecular contaminants will also have to be deployed.The book series Developments in Surface Contamination and Cleaning as a whole will provide an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area.Volume 8: Wet and Dry Cleaning MethodsSeveral novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Volume 7 & 8Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control this book will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.  Researchers in an academic setting will also find these volumes excellent source books. This Volume complements other volumes in this series and:. provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and other. covers novel wet and dry surface cleaning methods of increasing commercial importance INDICE: 1 Cleaning for Removal of Post Chemical Mechanical Planarization Residue (Manish Keswani)2 Liquid Displacement Drying Techniques (Ian Parry)3 UV Ozone Cleaning (Rajiv Kohli)4 Carbon Dioxide Dry Ice Spray Cleaning (Simon Motschmann)5 Use of Water Ice Pellets for Removal of Surface Contaminants (Rajiv Kohli)6 Advanced Cleaning Processes in Semiconductor Manufacturing (Mahmood Toofan)7 Precision Cleaning of Electronic Assemblies (Helmut Schweigert)

• ISBN: 978-0-323-29961-9
• Editorial: William Andrew
• Encuadernacion: Cartoné
• Páginas: 272
• Fecha Publicación: 01/01/2015
• Nº Volúmenes: 1
• Idioma: Inglés