Authored by Marc Madou, bestselling author and leading expert in mems and manufacturing at the nano scale, this textbook focuses on emerging trends in industrial lithography and pattern transfer. It covers photolithography and next generation lithographies and presents a number of subtractive etching techniques, including dry, chemical, and electrochemical wet. The author also explains thermal, electrothermal, and mechanical removing techniques. Designed for chemistry and materials students, it includes extensive references and a comprehensive glossary and provides worked out problems, along with end of chapter problems. PowerPoint slides and solutions are available for qualifying instructors.
- ISBN: 978-1-4200-5519-1
- Editorial: CRC Press
- Encuadernacion: Cartoné
- Páginas: 840
- Fecha Publicación: 22/09/2009
- Nº Volúmenes: 1
- Idioma: Inglés